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UniteKampus Free Download| unitekampus.pl · New Zork City (1997) DVDRip.The present invention relates generally to the manufacturing of microelectronic components. More specifically, the present invention relates to the use of immersion lithography to increase the resolution of small, highly integrated circuit devices.
To fabricate highly integrated circuits, it is desirable to use one or more lithographic processes to image a photoresist layer with a pattern for either metal or etching which will be used in the formation of metal interconnects. With the introduction of increasingly smaller, smaller, and more densely integrated circuit devices, use of increasingly smaller and more highly integrated circuit devices, and the corresponding generation of increased circuit density, there is a need for an optical projection lithography technology that will address these needs. One such lithographic projection system is immersion lithography.
In immersion lithography, a liquid is used to fill the space between the final lens of the lithographic apparatus and the surface of the wafer being patterned. Various challenges exist when designing immersion lithography projection systems. Among such challenges are the difficulty in achieving a cost effective system that provides a high numerical aperture, a stable and accurate calibration system, and a system that provides good fidelity for both the transparent liquid and the photoresist.
There are several reasons why immersion lithography is potentially advantageous for chip lithography over other options, such as conventional aerial lithography, and other alternatives such as scanning lithography. Among these benefits are the following. The use of immersion lithography with ultra-high NA optics has the potential to increase the resolution of current processes. The immersion liquid is present and disposed between the final lens of the lithographic apparatus and the wafer being patterned. Therefore, there is no requirement for an air gap as in conventional projection lithography. The absence of an air gap tends to reduce spherical aber
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